FKA 190, Modelling and Fabrication of Micro/Nanodevices

Project title:

Fabrication and characterization of low-loss coplanar waveguide lines on surface-passivated high resistivity silicon substrate for microwave integrated circuit applications

Project description:

1. Literature studies of the field.

1.1. Applications of Si monolithic microwave integrated circuits (MMIC’s).

1.2. Problem of high losses in coplanar waveguides (CPW) due to induced electron density at the silicon surface.

2. Fabrication of CPW lines on surface-passivated high resistivity silicon.

2.1. Formation of passivating layer on the surface of silicon substrate (deposition of polycrystalline (amorphous) silicon layer, formation of charge carrier traps by ion implantation).

2.2. Formation of silicon dioxide layer (reactive sputtering, thermal oxidation).

2.3. Formation of CPW lines (photolithography, e-beam evaporation of Au/Ti films, patterning by lift-off process)

3. Measurements of microwave losses of CPW lines by vector network analyzer as functions of frequency and dc field.

4. Analysing results and writing of a scientific report.

Contact:
Andrei Vorobyev
<andrei.vorobyev -et- mc2.chalmers.se>

Microwave Electronics Laboratory

SE-412 96 Gothenburg, SWEDEN

Telephone: +46 (0) 31-772 8931

Fax: +46 (0) 31-164513