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Week (1)
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Lecture 1 |
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Introduction (30 min) Review of thin film applications and material science. |
Chp 1 |
AY |
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Lecture 2 |
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The Process laboratory at MC2; clean room technology and safety
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US |
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Lecture 3 |
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Guided tour in lab |
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US |
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Week (2) |
Lecture 4 |
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Properties of thin films |
EXTRA |
AY |
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Lecture 5 |
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Photo-lithography |
Chp 2 |
AY |
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Lecture 6 |
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E-beam and other nanolithography (continued) |
Chp 2 +extra |
AY |
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Week (3) |
lecture 7 |
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Diffusion/Oxidation |
Chp 3-4 |
US |
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Wednesday 13-15 |
Lab 1: Lithography , group 1 |
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AY |
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Wednesday 15-17 |
Lab 1:Lithography ; group 2 |
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AY |
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Lecture 8 |
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Diffusion oxidation-1h/Ion Implantation 1 h |
Chp 4-5 |
US |
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Week (4) |
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Wednesday 113-15 |
Lab 1: Lithography ,group 3 |
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AY |
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Wednesday 15-17 |
Lab 1: Lithography , group 4 |
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AY |
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Problem solving1 ; Diffusion/Lithography |
Chp 3-5 |
AY |
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Lecture 9
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Vacuum, gas kinetics, pumping, measurements of low pressure ; 30 min display of pumps, gauges, vacuum parts. |
EXTRA |
AY |
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Lecture 10 |
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Discharges, plasmas, ion-surface interaction, sputtering & plasma- and ion-beam processing of thin films, pulsed laser deposition |
Chp 6 +extra |
AY |
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Week (5) |
Lecture 11 |
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Thin-film evaporation processes PVD, Sputter, hardware |
Chp 6 +extra |
AY |
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Wednesday 13-15 |
Lab 2: PVD |
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US |
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Wednesday 15-17 |
Lab 2: PVD |
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US |
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Lecture 12 |
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MBE/CVD |
Ch6 +extra |
AY |
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Lecture 13 |
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Characterization of thin-films and surfaces |
EXTRA |
US |
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Week (6) |
Lecture 13 |
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Wednesday 13-15 |
Lab 2; PVD |
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US |
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Wednesday 15-17 |
Lab 2; PVD |
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US |
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Problem solving 2(AY); Vacuum/Plasma processing/Deposition |
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AY |
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Lecture 14 |
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Interconnect/Packaging |
Chp 7-8 |
US |
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Week (7) |
Lecture 15 |
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MOS/Bipolar |
Chp 9-10 |
US |
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Lecture 16 |
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MEMS |
Chp 11 |
US |
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Project presentations |
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Week (8) |
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Examination |
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HT2006-timetable for FKA-196:
Microfabrication (5p)
Lectures: 32 h; labs & demonstrations: 8 h; project: 8 h.
(AY)- August Yurgens, tel. 3474, e-mail: Yurgens-et-mc2.chalmers.se
(US)- Ulf Södervall, tel. 3431, e-mail: Ulf.Sodervall-et-mc2.chalmers.se