FKA196 - Fundamentals of micro- and nanotechnology

( LP-1 2006/07 ) 5 points

Examiners: August Yurgens & Ulf Södervall
Course starts 04 September 2006
Place: (preliminary) A820 (Fasrummet) MC2 at 13.15


Microelectronics has had tremendous development during the last ten years broadening the field of applications in many directions. The industry is pushing the critical device dimensions downward the nanometer scale at a very rapid rate. This would not have been possible without development of thin film technology, nanoprocessing, and material science. A great many sophisticated instruments and techniques, developed to process and characterize thin films and surfaces, have already become indispensable in virtually every research area and high-tech industry. While the major exploitation of thin films is associated with microelectronics, there are numerous and growing novel applications in communication, optical electronics, energetics, coating, data storage, etc. Further development requires a continuous search for new materials advanced methods of deposition, nanoprocessing and characterization of thin films. 


The course aims at giving a basic knowledge of modern nanoscale thin-film technology, characterization techniques and emerging thin film materials and applications. Laboratory exercises in the clean room of the Microtechnology Centre at Chalmers (MC2) will demonstrate how the nanoscale machinery operates in reality

The goal is to learn material science aspects and physical principles of nanoscale technology, which will help students to understand the link between Processing-Structure-Properties-Performance of thin film devices and to be capable of choosing proper materials, deposition and characterization techniques for a given task. The course will make an overview over an actual research and development and most recent trends in nanoscale technology and will provide a basis for further studies at the undergraduate and postgraduate level, diploma work and professional preparation. 


The core of the course is dedicated to the theory and practice of thin-film techniques, one of the most important constituents of modern Nanoscale Technology. Various thin film deposition technologies will be covered in detail including thermal-evaporation, sputtering, chemical-vapor deposition and epitaxy. During the lectures students will also study the technology of vacuum systems including system operation and design, and the physical behavior of gases.Film formation, its structure and methods of characterization will be explained. Various physical properties of thin films: mechanical, electrical, magnetic, and optical will be covered, with an emphasis on the actual research and development in the thin film nanoscale technology and emerging practical applications of novel thin-films materials, like superlattices, diamond films, carbon-nanotubes, films for magnetic recording, and high-Tc superconductor films.


This course includes about 34 hours of lectures and problem solving, 8 hours of demonstrations involving thin-film deposition and photolithography,  and a literature project for 8 hours. A number of  home assignments will be given to deepen the knowledge obtained during the lectures.  

Teaching language:


Last updated: October 22, 2005