E-Beam Lithography

You will find in this page a few notes on electron beam lithography (EBL), on drawing principals and a few sample or drawing templates.

Standard references by MC2 are found at the former SNL laboratory at http://fy.chalmers.se/assp/snl/.

Sketch of the multiple 5x5 sample holders:

            Old round:                                        JEOL 5x5mm holder.ppt

            New holder (3in mask type):         new 5x5 holder.pdf

Sketch of the cassette loading position:   JEOL Cassette.ppt

EOS tables:    JEOL-EOS-tables.pdf

Some instructions for conversion and operation of the JEOL

EBeam conversion instructions.pdf

JEOL operation introduction.ppt or JEOL operation introduction.pdf

JEBCAD

The following command file can be placed in the root directory to have JEBCAD display by default the various doses with colors.

JEBCAD_INITIAL.COMMAND

AutoCAD

I use AutoCAD to draw the lithography patterns. Thru export in DXF format, AutoCAD is fully compatible with the JEOL file system. Here are some notes on the basics of EBL and the use of AutoCAD as drawing software.

e-beam lithography and design principles.pdf

I have written some useful scripts for AutoCAD to verify drawings, close polylines and do grain boundary rotation. Download and extract the files contained in this zip file. They should go to the proper directory.  Note: it will replace the ACAD.LSP file which makes no harm if you have not modified it yourself.

userlsp.zip

Other stuff and examples:

It is possible to study the proximity effect present in e-beam lithography using a simple convolution of a pattern and a beam shape. The following MATLAB functions perform such calculations.

ebeamprox.m

Regarding the interaction the electron beam with matter and the scattering processes involved, one can use CASINO, a software developed at Université de Sherbrooke. It is free and simple to use. Here is an example of a problem definition using multiple layers of PMMA/SiO2/W/Si.

TEMPLATES:

Set of alignment marks for 5mm x 5mm chips. This template can be used for both our standard e-beam lithography grain boundary alignment strategy (cross alignment marks and rulers) and for photolithography (Moiré patterns and normal cross alignment marks).

AlignMarks.dwg

Pattern example (Josephson junctions of various width)

Example.dwg

Dot-matrix like characters to be used in lithography (normal text does not work)

dottext-dwg.zip

JEOL SCRIPTS:

Scripts used in typical bicrystal process

-          First lithography (without alignment)

            Alignment marks and rulers (low current)

            Contact pads (high current)

-          Second lithography (with alignment)

            Josephson junctions and small features (low current)

            Connections (high current)

 

 

DWRULER.JDF        DWRULER.SDF

DWPADS.JDF           DWPADS.SDF

 

DWJJ.JDF       DWJJ.SDF

DWCON.JDF            DWCON.SDF

Scripts used for mask making (single current)

OLDMASK.JDF        OLDMASK.SDF

Scripts used for mask making (two currents)

N/A 

 

From the workshop (May 9, 2003):

            Workshop agenda and references:        EBL workshop.ppt

            Drawing file format conversion: VLSI Drawings transferring limitations.ppt

            Multiple exposure strategy:        Multiple current exposure.ppt

            CASINO software:      Casino.ppt