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Electrical characterization techniques: Hall effect (by van der Pauw technique), electrochemical profiling (ECV) and CV/ IV-set up

Optical characterisation equipments: Photoluminescence (PL) set-up with Ar-, He-Cd- and He-Ne-lasers, CCD-camera, and 2 monochromators, covering ~200 nm to 3 µm.

Access to the microelectronics infrastructure at MC2 for analysis and device processing and fabrication.

Access to equipments and know-how for material characterization at Chalmers (SIMS, HRXRD, SEM, TEM, AFM, SAM, etc.)