9 a) Colloidal Lithography approach to fabricate nanoscale SFG devices
The project will involve the design and fabrication of nanoscale optical active nanoparticles for use in sum frequency generation experiments. Arrays of metal particles will be fabricated utilizing a self assembled colloidal monolayer mask (colloidal lithography) and dry etching into a metallic thin film. These metallic paricles support surface plasmon excitations. The energy of these excitations is sensitive to the particle size and shape but also to the local refractive index (making them useful as nanoscale sensors). Here particles with energy tuned to interact with specific wavelengths of light will be fabricated for use in sum frequency generation experiments (not part of the project).
Characterisation will be by SEM, AFM and Optical Spectroscopy

9 b) Colloidal Lithography fabrication of well defined topographic patterns in silicon
A range of substrates with well defined topography and chemistry will be produced by colloidal lithography and dry etching/lift off. The range of substrates can be used for calibration of AFM’s or for the study of molecular interactions at interfaces. Characterisation will be by SEM and AFM

For more details about either project contact 
Dr. Duncan Sutherland
Dept. Applied Physics
Chalmers
F5125 Forskarhuset
772 34 28

Contact person    Duncan Sutherland