Wafer surface cleaning with a new technique

Ulf Södervall and Bengt Nilsson

Task:

We have purchased a new chemical that is offering an alternative way of cleaning surfaces.

Short description of device:

We like to test some different materials and surfaces (Quartz, silicon, silicon dioxide) with this new chemical, to see its features after e.g. CMP. dicing, other processing

Processes:
CMP, Optical lithography, nanoimprint

Characterization:
Dark field Microscopy , Phase contrast microscopy, possibly AFM and other surface particle characterization technique.

Number of students:            2

Contact person: Ulf Södervall

Tel: +46 31 7723431
fax: +46 31 7728498
GSM: 070 3218178
Email: <ulf.sodervall -et- mc2.chalmers.se>