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Figure 1. The Dolan bridge technique. After the first evaporation (from the right) the aluminum electrodes are oxidized to create a thin insulating Al2O3 layer. Then the second evaporation (from the left will create a tunnel junction under the bridge. Picture courtesy of Peter Wahlgrenİ.


This table shows some parameters of the two chips reported in this thesis. They are calculated from a large scale I-V curve. 

    Sample  Array size  RN (k)  EJ/kB (K)  EC/kB (K)
    H7#43   168x168     33.0     0.215      0.693
    H9#44   168x168     7.59     3.72       0.672



Figure 2. Two SEM pictures of a 2D-array. (a) The entire array with the Hall probes on the left and right sides and two contacts on each of the solid bars at the top and bottom of the array. (b) A close-up of a few Al islands, each connected to four other islands by tunnel junctions. The size of the tunnel junctions is approximately 100x200 nm and the unit cell area, i.e. one loop (dark) and one aluminum island (gray), is 0.8x1.6 µm=1.3 µm2.


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